Karey L. Holland

Positive DUV resist (APEX-E) by IBM for SVGL Micrascan

Vasanti A. Deshpande, Nathan S. Thane, John S. Hargreaves, 1993, Advanced Lithography.

Performance of a 0.5 NA broadband DUV step-and-scan system

Yumiko Takamori, Karey L. Holland, Timothy J. Wiltshire, 1993, Advanced Lithography.

Isolated-grouped linewidth bias on SVGL Micrascan

Vasanti A. Deshpande, Karey L. Holland, Alex Hong, 1993, Advanced Lithography.

Deep-ultraviolet lithography for 500-nm devices

Karey L. Holland, Steven J. Holmes, Ruth Levy, 1990, Advanced Lithography.

Manufacturing implementation of deep-UV lithography for 500-nm devices

John L. Sturtevant, Karey L. Holland, Steven J. Holmes, 1992, Advanced Lithography.