Kiyoshi Ishikawa

Resist characteristics with direct-write electron beam and SCALPEL exposure system

Anthony E. Novembre, Mitsuru Sato, Katsumi Omori, 1999, Advanced Lithography.

Split Capacitor DAC Mismatch Calibration in Successive Approximation ADC

Sanroku Tsukamoto, Hirotaka Tamura, Tadahiro Kuroda, 2010 .

TRANSIENT FLEXURAL VIBRATION ANALYSIS FOR CLAMPED VOIGT-VISCOELASTIC RECTANGULAR PLATES

Kiyoshi Ishikawa, Shotaro Natsume, 1987 .

New 78K0R Series 16-bit Microcomputers

Masataka Nakano, Kiyoshi Ishikawa, Makoto Mizoguchi, 2007 .

3-D Topography and Impurity Integrated Process Simulator (3-D MIPS) and Its Applications

Satoru Kawazu, Katsumi Eikyu, Tadashi Nishimura, 1999 .

Resist outgassing in electron projection lithography

Tasuku Matsumiya, Sumito Shimizu, Tomoyuki Ando, 2004, SPIE Advanced Lithography.

Quantum nondemolition measurement of spin via the paramagnetic Faraday rotation

Kiyoshi Ishikawa, Yoshiro Takahashi, Kenji Toyoda, 1999 .

Fabrication of the nanoimprint mold using inorganic electron beam resist with post exposure bake

Miyako Shizuno, Noriyuki Unno, Jun Taniguchi, 2008 .