Elsa Reichmanis

发表

Soft, Responsive and Semiconducting Gels

Cornelia Rosu, Paul S. Russo, Elsa Reichmanis, 2018 .

Machine Learning Approaches for Extracting Process–Structure–Property Relationships from Experimental Data and Literature

Elsa Reichmanis, Martha A. Grover, Nils Persson, 2020 .

Preliminary lithographic characteristics of an all-organic chemically amplified resist formulation for single-layer deep-UV lithography

Elsa Reichmanis, Omkaram Nalamasu, May Cheng, 1991, Other Conferences.

Mechanism of single-layer 193-nm dissolution inhibition resist

Elsa Reichmanis, Omkaram Nalamasu, Francis M. Houlihan, 2000, Advanced Lithography.

Dissolution properties of cycloolefin-maleic-anhydride-based resist resins

Elsa Reichmanis, Allen H. Gabor, Omkaram Nalamasu, 2000, Advanced Lithography.

Challenges in lithographic materials and processes

Elsa Reichmanis, Larry F. Thompson, 1990, AT&T Technical Journal.

COMMENT: COMMUNICATING FOR SUCCESS

Elsa Reichmanis, 2004 .

Structure – Process - Property Relationships Governing Solution Processed Semiconductor Performance

Elsa Reichmanis, 2016 .

COMMENTS: SCHEDULING SYMPOSIA NEEDS NEW APPROACH

Elsa Reichmanis, 2003 .

Deep UV Positive Resists For Two-Level Photoresist Processes

Elsa Reichmanis, G. Smolinsky, 1984, Advanced Lithography.

Experimental Tests Of The Steady-State Model For Oxygen Reactive Ion Etching Of Silicon-Containing Polymers

Elsa Reichmanis, C. W. Jurgensen, A. Shugard, 1988, Advanced Lithography.

Frontiers of Materials Research: A Decadal Survey

Christine E Heckle, Tom C. Lubensky, Elsa Reichmanis, 2019 .

193-nm single-layer photoresists based on alternating copolymers of cycloolefins: the use of photogenerators of sulfamic acids

John J. Biafore, Sydney G. Slater, Elsa Reichmanis, 1998, Advanced Lithography.

Plastic electronic devices: From materials design to device applications

Elsa Reichmanis, Ashok Maliakal, Howard Katz, 2005, Bell Labs Technical Journal.

Base additives for use in a single layer 193-nm resist based upon poly(norbornene/maleic anhydride/acrylic acid/tert-butyl acrylate)

Elsa Reichmanis, Omkaram Nalamasu, Francis M. Houlihan, 2001, SPIE Advanced Lithography.

Chemical Factors Affecting Npr Performance

Elsa Reichmanis, R. G. Tarascon, Larry F. Thompson, 1987, Advanced Lithography.

Overview of photoacid generator design for acetal resist systems

John J. Biafore, Thomas I. Wallow, Elsa Reichmanis, 1997, Advanced Lithography.

Solving Materials’ Small Data Problem with Dynamic Experimental Databases

Elsa Reichmanis, Martha A. Grover, Nils Persson, 2018, Processes.

Ring oscillator fabricated completely by means of mass-printing technologies

Elsa Reichmanis, H. Kempa, U. Fuegmann, 2007 .

Investigation of the exposure and bake of a positive acting resist with chemical amplification

Andrew R. Neureuther, Elsa Reichmanis, Chris A. Spence, 1990, Advanced Lithography.

Life Cycle Inventory Assessment as a Sustainable Chemistry and Engineering Education Tool

Elsa Reichmanis, Mahmood Sabahi, 2017 .

Optimization of 193-nm single-layer resists through statistical design

Elsa Reichmanis, Omkaram Nalamasu, Allen H. Gabor, 1999, Advanced Lithography.

Single-component chemically amplified resist materials for electron-beam and x-ray lithography

Elsa Reichmanis, J. E. Hanson, Omkaram Nalamasu, 1991, Other Conferences.

Recent advances in increasing the thermal flow resistance of acetal-derivatized polyhydroxystyrene deep-UV matrix resins

Elsa Reichmanis, Omkaram Nalamasu, Janet M. Kometani, 1998, Advanced Lithography.

Recent advances in 193-nm single-layer photoresists based on alternating copolymers of cycloolefins

Elsa Reichmanis, Raymond A. Cirelli, Omkaram Nalamasu, 1997, Advanced Lithography.

A method for manufacturing a device

Elsa Reichmanis, Larry F. Thompson, Gary N. Taylor, 1991 .

Of members and muggles: Let's communicate!

Elsa Reichmanis, E. Reichmanis, 2003 .

Model study by FT-IR and 13C NMR of the interaction of poly(norbornene-alt-maleic anhydride) and its derivatives with select cholate dissolution inhibitors or with select iodonium and sulfonium phot

Elsa Reichmanis, Omkaram Nalamasu, Francis M. Houlihan, 2000, Advanced Lithography.

Evaluation of cycloolefin-maleic anhydride alternating copolymers as single-layer photoresists for 193-nm photolithography

Thomas I. Wallow, Elsa Reichmanis, Omkaram Nalamasu, 1996, Advanced Lithography.

Advanced positive photoresists for practical deep-UV lithography

Sydney G. Slater, Andrew J. Blakeney, Elsa Reichmanis, 1994, Advanced Lithography.

Novel organic and polymeric semiconductors for plastic electronics

Zhenan Bao, Elsa Reichmanis, Paul S. Drzaic, 2001, SPIE Optics + Photonics.

Positive-tone processing of plasma-polymerized methylsilane (PPMS)

Elsa Reichmanis, Raymond A. Cirelli, Omkaram Nalamasu, 1998, Advanced Lithography.

Preparation And Lithographic Properties Of Poly(Trimethylsilylmethyl Methacrylate-Co-Chloromethyl Styrene)

Elsa Reichmanis, Anthony E. Novembre, Myrtle Davis, 1986, Advanced Lithography.

Toward data-enabled process optimization of deformable electronic polymer-based devices

Elsa Reichmanis, Martha A. Grover, Michael McBride, 2020 .

SINGLE-LAYER RESIST DESIGN FOR 193NM LITHOGRAPHY

Elsa Reichmanis, Raymond A. Cirelli, F. M. Houlihan, 1999 .

New polymers for 193-nm single-layer resists based on substituted cycloolefins/maleic anhydride resins

Sydney G. Slater, Elsa Reichmanis, Mark Neisser, 1999, Advanced Lithography.

Lithographic behavior of carboxylate-based dissolution inhibitors and the effect of blending

Elsa Reichmanis, Omkaram Nalamasu, Francis M. Houlihan, 2001, SPIE Advanced Lithography.

Toward the ultimate storage device: the fabrication of an ultrahigh-density memory device with 193-nm lithography

Elsa Reichmanis, Fred Baumann, Omkaram Nalamasu, 1999, Advanced Lithography.

An Evaluation Of Nitrobenzyl Ester Chemistry For Chemical Amplification Resists

Elsa Reichmanis, A. Shugard, F. M. Houlihan, 1988, Advanced Lithography.

Synthesis And Lithographic Characterization Of A Novel Organosilicon Novolac Resin

Elsa Reichmanis, R. G. Tarascon, A. Shugard, 1986, Advanced Lithography.

Process Parameters For Submicron Electron Beam Lithography Of NPR

Elsa Reichmanis, R. G. Tarascon, J. Frackoviak, 1987, Advanced Lithography.

Model study by FT-IR of the interaction of select cholate dissolution inhibitors with poly(norbornene-alt-maleic anhydride) and its derivatives

Elsa Reichmanis, Allen H. Gabor, Omkaram Nalamasu, 1999, Advanced Lithography.

Resist outgassing as a function of differing photoadditives

Roderick R. Kunz, Elsa Reichmanis, Allen H. Gabor, 1999, Advanced Lithography.

Development of a chemically amplified positive resist material for single-layer deep-UV lithography

Elsa Reichmanis, Sheila Vaidya, Omkaram Nalamasu, 1990, Advanced Lithography.

Research in Macromolecular Science: Challenges and Opportunities for the Next Decade

Elsa Reichmanis, Stephen Z. D. Cheng, Timothy P. Lodge, 2009 .

Chemically Amplified Resists: A Lithographic Comparison of Acid Generating Species.

Elsa Reichmanis, Janet M. Kometani, Larry F. Thompson, 1989, Advanced Lithography.

COMMENT: CHEMISTRY NEEDS A NEW IMAGE

Elsa Reichmanis, 2002 .

Effects of Carboxylated Polythiophenes in Fe 3 O 4 Li-Ion Battery Anodes

Elsa Reichmanis, 2017 .

COMMENT: NETWORKING FOR ALL CHEMISTS

Elsa Reichmanis, E. Reichmanis, 2003 .

Polymers in microlithography : materials and processes

Elsa Reichmanis, Scott A. MacDonald, Takao Iwayanagi, 1989 .

Nitrobenzyl ester chemistry for polymer processes involving chemical amplification

Elsa Reichmanis, A. Shugard, F. M. Houlihan, 1988 .

High-Throughput Image Analysis of Fibrillar Materials: A Case Study on Polymer Nanofiber Packing, Alignment, and Defects in Organic Field Effect Transistors.

Elsa Reichmanis, Michael McBride, Tony Fast, 2017, ACS applied materials & interfaces.

Flow Effects on the Controlled Growth of Nanostructured Networks at Microcapillary Walls for Applications in Continuous Flow Reactions.

Elsa Reichmanis, Luye He, Cansheng Yuan, 2015, ACS applied materials & interfaces.

Microfluidic Crystal Engineering of π-Conjugated Polymers.

Elsa Reichmanis, Martha A. Grover, Mincheol Chang, 2015, ACS nano.

Photo- and thermochemistry of select 2,6-dinitrobenzyl esters in polymer matrixes: studies pertaining to chemical amplification and imaging

Elsa Reichmanis, Janet M. Kometani, Larry F. Thompson, 1990 .

Synthesis of Cycloolefin−Maleic Anhydride Alternating Copolymers for 193 nm Imaging

Elsa Reichmanis, Omkaram Nalamasu, F. M. Houlihan, 1997 .

Tunable Crystallinity in Regioregular Poly(3‐Hexylthiophene) Thin Films and Its Impact on Field Effect Mobility

Elsa Reichmanis, David M. Collard, Jung-Il Hong, 2011 .

Radiation-induced chemistry of poly(4-[(tert-butoxycarbonyl)oxy]styrene-co-sulfur dioxide)

Elsa Reichmanis, Omkaram Nalamasu, Janet M. Kometani, 1992 .

A Commercially Viable 193nm Single Layer Resist Platform

Elsa Reichmanis, Raymond A. Cirelli, Omkaram Nalamasu, 1997 .

Synthesis and evaluation of copolymers of (tert-butoxycarbonyloxy)styrene and (2-nitrobenzyl)styrene sulfonates: single-component chemically amplified deep-UV imaging materials

Elsa Reichmanis, J. E. Hanson, F. M. Houlihan, 1992 .

LITHOGRAPHIC RESIST MATERIALS CHEMISTRY

Elsa Reichmanis, Anthony E. Novembre, E. Reichmanis, 1993 .

Polymers for microlithographic applications: New directions and challenges

Elsa Reichmanis, Omkaram Nalamasu, Francis M. Houlihan, 2001 .

Molecular-channel driven actuator with considerations for multiple configurations and color switching

Zhiping Xu, Elsa Reichmanis, Yang Guo, 2018, Nature Communications.

Photopolymer Materials and Processes for Advanced Technologies

Elsa Reichmanis, James V. Crivello, E. Reichmanis, 2014 .

AN OVERVIEW OF RESIST PROCESSING FOR DEEP-UV LITHOGRAPHY

Elsa Reichmanis, Omkaram Nalamasu, May Cheng, 1991 .

Chemical Amplification Mechanisms for Microlithography

Elsa Reichmanis, Omkaram Nalamasu, F. M. Houlihan, 1991 .

Lithographic Evaluation of Phenolic Resin—Dimethyl Siloxane Block Copolymers

Elsa Reichmanis, M. J. Jurek, 1989 .

Competition between Charge Transport and Energy Barrier in Injection-Limited Metal/Quantum Dot Nanocrystal Contacts

Elsa Reichmanis, Mincheol Chang, Doo-Hyun Ko, 2014 .

Fundamental Studies of Molecular Interactions and Dissolution Inhibition in Poly(norbornene-alt-maleic anhydride)-Based Resins

Elsa Reichmanis, Omkaram Nalamasu, Zhenglin Yan, 2000 .

A novel approach to o‐nitrobenzyl photochemistry for resists

Elsa Reichmanis, Edwin Arthur Chandross, E. Reichmanis, 1981 .

Design, synthesis, characterization, and use of all-organic, nonionic photogenerators of acid

Elsa Reichmanis, Janet M. Kometani, F. M. Houlihan, 1991 .

Influence of Polymer Structure on the Miscibility of Photoacid Generators

Elsa Reichmanis, F. A. Baiocchi, K. E. Uhrich, 1994 .

Fundamental Studies of the Effects of Photo-additive Structure on Resist Outgassing

Roderick R. Kunz, Elsa Reichmanis, Allen H. Gabor, 1999 .

Versatile Interpenetrating Polymer Network Approach to Robust Stretchable Electronic Devices

Elsa Reichmanis, Nils Persson, Michael McBride, 2017 .

Micro- and Nanopatterning Polymers

Hiroshi Ito, Elsa Reichmanis, Omkaram Nalamasu, 1998 .

Chemical amplification mechanisms for microlithography

Elsa Reichmanis, Omkaram Nalamasu, F. M. Houlihan, 1991 .

Hydrogen Bonding in Sulfone- andN-Methylmaleimide-Containing Resist Polymers with Hydroxystyrene and Acetoxystyrene: Two-Dimensional NMR Studies

Elsa Reichmanis, Sharon A. Heffner, E. Reichmanis, 1995 .

Organic Materials Challenges for 193 nm Imaging

Elsa Reichmanis, Omkaram Nalamasu, F. M. Houlihan, 1999 .

The Effect of Substituents on the Photosensitivity of 2‐Nitrobenzyl Ester Deep U.V. Resists

Elsa Reichmanis, Edwin Arthur Chandross, C. W. Wilkins, 1983 .

Arylmethyl sulfones: A new class of photoacid generators

Elsa Reichmanis, J. E. Hanson, Janet M. Kometani, 1992 .

Polymer Materials for Microlithography

Elsa Reichmanis, Larry F. Thompson, E. Reichmanis, 1987 .