Vikram Tolani

发表

Classification and printability of EUV mask defects from SEM images

Wonil Cho, Daniel Price, Paul A. Morgan, 2017, Photomask Technology.

EUV mask absorber and multi-layer defect disposition techniques using computational lithography

Masaki Satake, Vikram Tolani, David Kim, 2011, Photomask Technology.

Computational lithography and inspection (CLI) and its applications in mask inspection, metrology, review, and repair

Vikram Tolani, Linyong Pang, Danping Peng, 2010, Photomask Technology.

Deep subwavelength mask assist features and mask errors printability in high NA lithography

Wen-Hao Cheng, Vikram Tolani, Bob Gleason, 2006, SPIE Photomask Technology.

EUV multilayer defect compensation (MDC) by absorber pattern modification: from theory to wafer validation

Masaki Satake, Vikram Tolani, Linyong Pang, 2011, Photomask Technology.

Computational mask defect review for contamination and haze inspections

Daniel Price, Paul A. Morgan, Daniel Rost, 2013, Photomask Technology.

Mask Pattern Recovery Using Level Set Method and its Application on Defect Auto Disposition based on Simulated Aerial/Wafer Image

David Kim, Vikram Tolani, Jinhyung Park, 2009 .

Automated Defect Classification (ADC) and Progression Monitoring (DPM) in wafer fab reticle requalification

Vikram Tolani, Bill Wang, Peter Hu, 2013, Photomask Technology.

EUV multilayer defect compensation (MDC): latest progress on model and compensation methods

Masaki Satake, Vikram Tolani, Linyong Pang, 2013, Photomask Technology.

EUV multilayer defect compensation (MDC) by absorber pattern modification: improved performance with deposited material and other progresses

Ying Li, Masaki Satake, Vikram Tolani, 2012, Photomask Technology.

Lithographic plane review (LPR) for sub-32nm mask defect disposition

Vikram Tolani, Linyong Pang, Noel Corcoran, 2010, Photomask Technology.

Investigation of Nanomachining as a Technique for Geometry Reconstruction

Vikram Tolani, Roy White, Ron Bozak, 2002, Photomask Technology.

EUV multilayer defect compensation (MDC) by absorber pattern modification, film deposition, and multilayer peeling techniques

Ying Li, Masaki Satake, Vikram Tolani, 2013, Advanced Lithography.

ArF lithography reticle crystal growth contributing factors

Vikram Tolani, Florence Eschbach, Daniel Tanzil, 2004, SPIE Photomask Technology.

Best depth of focus on 22-nm logic wafers with less shot count

David Kim, Vikram Tolani, Tadashi Komagata, 2010, Photomask Japan.

Considering MEEF in inverse lithography technology (ILT) and source mask optimization (SMO)

Vikram Tolani, Guangming Xiao, Bob Gleason, 2008, Photomask Technology.

Compensation for EUV multilayer defects within arbitrary layouts by absorber pattern modification

Ying Li, Masaki Satake, Vikram Tolani, 2011, Advanced Lithography.

Evaluation of AIMS D2DB simulation without calibration images

Vikram Tolani, Katsuya Hayano, Hideyoshi Takamizawa, 2014, Photomask and Next Generation Lithography Mask Technology.

Source-mask co-optimization (SMO) using level set methods

Vikram Tolani, Bob Gleason, Linyong Pang, 2009, Photomask Technology.

Computational inspection applied to a mask inspection system with advanced aerial imaging capability

Vikram Tolani, Thuc Dam, Linyong Pang, 2010, Advanced Lithography.

Computational defect review for wafer-fab reticle requal, part 1: mask plane inspections

Ying Li, Vikram Tolani, Linyong Pang, 2012, Photomask Technology.

Computational defect review for actinic mask inspections

Paul A. Morgan, Daniel Rost, Masaki Satake, 2013, Advanced Lithography.

LER transfer from a mask to wafers

Naoya Hayashi, Vikram Tolani, Hiroyoshi Tanabe, 2007, Photomask Japan.

Bridging the gaps between mask inspection/review systems and actual wafer printability using computational metrology and inspection (CMI) technologies

Masaki Satake, Vikram Tolani, Linyong Pang, 2012, Photomask Technology.

Efficiency and throughput improvement on defect disposition through automated defect classification

Paul Yu, Vikram Tolani, Noel Corcoran, 2011, Photomask Technology.

From Computational Lithography to Computational Inspection: Inverse Lithography Technology (ILT) and Inverse Inspection Technology (IIT)

Ki-Ho Baik, Vikram Tolani, Guangming Xiao, 2010 .

Toward a consistent and accurate approach to modeling projection optics

Vikram Tolani, Thuc Dam, Danping Peng, 2010, Advanced Lithography.

Inverse Lithography Technology (ILT) Enabled Source Mask Optimization (SMO)

Ki-Ho Baik, Vikram Tolani, Guangming Xiao, 2009 .

Impact of DUV exposure on reticle repairs

Vikram Tolani, Daniel J. Bald, Daniel Tanzil, 2005, SPIE Photomask Technology.

Mask pattern recovery by level set method based inverse inspection technology (IIT) and its application on defect auto disposition

David Kim, Ki-Ho Baik, Vikram Tolani, 2009, Photomask Technology.

Expanding the applications of computational lithography and inspection (CLI) in mask inspection, metrology, review, and repair

Ying Li, Vikram Tolani, Linyong Pang, 2011, Advanced Lithography.

Computational inspection applied to a mask inspection system with advanced aerial imaging capability

Vikram Tolani, Linyong Pang, Thuc Dam, 2010, Photomask Japan.

Source mask optimization (SMO) at full chip scale using inverse lithography technology (ILT) based on level set methods

Vikram Tolani, Guangming Xiao, Bob Gleason, 2009, Lithography Asia.

Improvements of AIMS D2DB matching for product patterns

Masaki Satake, Vikram Tolani, Hiroyuki Miyashita, 2015, Other Conferences.

Optimization from design rules, source and mask, to full chip with a single computational lithography framework: level-set-methods-based inverse lithography technology (ILT)

Vikram Tolani, Guangming Xiao, Bob Gleason, 2010, Advanced Lithography.

Image-based metrology software for analysis of features on masks and wafers

Vikram Tolani, Saghir Munir, Daniel J. Bald, 2004, SPIE Photomask Technology.

Source-mask optimization (SMO): from theory to practice

Ki-Ho Baik, Vikram Tolani, Bob Gleason, 2010, Advanced Lithography.

Femtopulse laser-based mask repair in the DUV wavelength regime

Vikram Tolani, Roy White, Ron Bozak, 2006, Photomask Japan.

Trade-off between inverse lithography mask complexity and lithographic performance

Sang-Gyun Woo, Vikram Tolani, Guangming Xiao, 2009, Photomask Japan.

Computational techniques for determining printability of real defects in EUV mask pilot line

Ying Li, Paul A. Morgan, Daniel Rost, 2014, Advanced Lithography.

DIVAS: an integrated networked system for mask defect dispositioning and defect management

Vikram Tolani, Dan Bald, Saghir Munir, 2003, SPIE Advanced Lithography.

DIVAS: fully automated simulation based mask defect dispositioning and defect management system

Vikram Tolani, Dan Bald, Saghir Munir, 2004, SPIE Photomask Technology.

Improve mask inspection capacity with Automatic Defect Classification (ADC)

Vikram Tolani, Eric Guo, Linyong Pang, 2013, Photomask Technology.

Reticle decision center: a novel applications platform for enhancing reticle yield and productivity at 10nm technology and beyond

Chun-Jen Chen, Vikram Tolani, Laurent C. Tuo, 2016, Photomask Technology.

Need for comprehensive reticle data management and analytics

Masaki Satake, Vikram Tolani, Peter Liu, 2020, Photomask Technology.

Lithography printability review: the ultimate step in reticle analyzer to avoid killer mask defects in wafer fab manufacturing

Vikram Tolani, Chin Kuei Chang, Chain Ping Chen, 2021, Photomask Technology.

The application of reticle analyzer in DRAM fab

Asei Chou, Andy Lan, Vikram Tolani, 2021, Photomask Japan.

Computational metrology and inspection (CMI) in mask inspection, metrology, review, and repair

Ying Li, Masaki Satake, Vikram Tolani, 2012 .