Katja Viatkina

Influence of etch process on contact hole local critical dimension uniformity in extreme-ultraviolet lithography

Gijsbert Rispens, Gian F. Lorusso, Ming Mao, 2015, Advanced Lithography.

Ultimate intra-wafer critical dimension uniformity control by using lithography and etch tool corrections

Patrick Jaenen, Mircea Dusa, Liesbeth Reijnen, 2016, Advanced Lithography.

Scanner and etch co-optimized corrections for better overlay and CD control

Katja Viatkina, Young-Sik Kim, Owen Chen, 2019, Advanced Lithography.

Integrated approach to improving local CD uniformity in EUV patterning

Katja Viatkina, Jan Hermans, Mircea Dusa, 2017, Advanced Lithography.

Reducing the impact of etch-induced pattern shift on overlay by using lithography and etch tool corrections

Patrick Jaenen, Katja Viatkina, David Hellin, 2017, Advanced Lithography.