Herbert Buschbeck

Masked ion beam lithography and direct structuring on curved surfaces

Elmar Platzgummer, Hans Loeschner, John C. Wolfe, 2003, SPIE Advanced Lithography.

Large-field ion optics for projection and proximity printing and for maskless lithography (ML2)

Elmar Platzgummer, Hans Loeschner, Patrick W. de Jager, 2002, SPIE Advanced Lithography.

Projection maskless lithography

Elmar Platzgummer, Hans Loeschner, Thomas Elster, 2004, SPIE Advanced Lithography.

Large-field particle beam optics for projection and proximity printing and for maskless lithography

Elmar Platzgummer, Hans Loeschner, Joerg Butschke, 2003 .

Novel electrostatic column for ion projection lithography

R. W. Hill, Lloyd R. Harriott, Ka-Ngo Leung, 1994 .

Deep ultraviolet resists AZ DX-561 and AZ DX-1300P applied for electron beam and masked ion beam lithography

F. Shi, Hans Loschner, Ivan Kostic, 1997 .

Experimental results of the stochastic Coulomb interaction in ion projection lithography

F. Shi, Rainer Kaesmaier, Hans Loschner, 1999 .