Wataru Shibayama

EUV lithography and etching performance enhancement by EUV sensitive Si hard mask (EUV Si-HM) for 1Xnm hp generation

Wataru Shibayama, Shuhei Shigaki, Noriaki Fujitani, 2014, Advanced Lithography.

EUV sensitive Si containing hard mask (Si-HM) for PTD and NTD process in EUVL

Wataru Shibayama, Shuhei Shigaki, Ryuji Onishi, 2013, Advanced Lithography.