Nishimura Eiichi

Fabrication of 22-nm poly-silicon gate using resist shrink technology

Satoru Shimura, Tetsu Kawasaki, Masato Kushibiki, 2009, Advanced Lithography.

Quantification of Plunger Resistance Force during Intraocular Lens Insertion Using an Various Injectors

Takahashi Haruo, Nishimura Eiichi, Soda Mitsutaka, 2016 .