Xu Tian

De-Pinning Fermi Level and Accelerating Surface Kinetics with an ALD Finish Boost the Fill Factor of BiVO4 Photoanodes to 44.

Shihan Yan, Renbo Lei, Zheng Guo, 2023, Small.

Remarkable Bias‐Stress Stability of Ultrathin Atomic‐Layer‐Deposited Indium Oxide Thin‐Film Transistors Enabled by Plasma Fluorination

Jiye Li, Shengdong Zhang, Qingqin Ge, 2024, Advanced Functional Materials.