Shuichi Noda

Defect-free fabrication of nano-disk and nano-wire by fusion of bio-template and neutral beam etching

Seiji Samukawa, Shuichi Noda, Akio Higo, 2016, SPIE/COS Photonics Asia.

High-precision EB technology with thin EB resist and distortion-free mask holder for x-ray mask fabrication

Shuichi Noda, Hiroshi Hoga, 1995, Photomask and Next Generation Lithography Mask Technology.

Fabrication of reliable x-ray mask using high-temperature deposited SiN membrane by low-pressure chemical vapor deposition system

Shuichi Noda, Hiroshi Hoga, Tsuneaki Ohta, 1994, Photomask and Next Generation Lithography Mask Technology.

Simulation of x-ray mask displacement by absorber and membrane stress

Shuichi Noda, Hiroshi Hoga, Tsuneaki Ohta, 1996, Photomask and Next Generation Lithography Mask Technology.

Fabrication of FinFETs by Damage-Free Neutral-Beam Etching Technology

K. Endo, T. Matsukawa, H. Yamauchi, 2006, IEEE Transactions on Electron Devices.

High-Performance GaN MOSHEMTs Fabricated With ALD Al2O3 Dielectric and NBE Gate Recess Technology for High Frequency Power Applications

Po-Chun Chang, Seiji Samukawa, Heng-Tung Hsu, 2017, IEEE Electron Device Letters.