Luigi Pantisano

发表

Introduction to the Special Issue: High- $k$ Reliability—Status 2009

Byoung Hun Lee, Luigi Pantisano, Masaaki Niwa, 2009 .

On the rseries extraction techniques for sub-22nm CMOS finfet and SiGe technologies

G. Groeseneken, Luigi Pantisano, G. Hellings, 2012, Proceedings of Technical Program of 2012 VLSI Technology, System and Application.

Potential remedies for the VT/Vfb-shift problem of Hf/polysilicon-based gate stacks: a solution-based survey

Luigi Pantisano, Tom Schram, J. Chen, 2005, Microelectron. Reliab..

Hot carrier stress and breakdown impact on high-frequency MOSFET analog performance

Dominique Schreurs, Guido Groeseneken, B. Kaczer, 2004 .

Improving workfunction control of metal gate electrodes

Barry O'Sullivan, Guido Groeseneken, Luigi Pantisano, 2006 .

On the data interpretation of the C-AFM measurements in the characterization of thin insulating layers

Luigi Pantisano, Wilfried Vandervorst, Robin Degraeve, 2005, Microelectron. Reliab..

Mechanism of O2-anneal induced Vfb shifts of Ru gated stacks

Z. Li, Luigi Pantisano, Tom Schram, 2007, Microelectron. Reliab..

Reliability screening of high-k dielectrics based on voltage ramp stress

Anabela Veloso, Guido Groeseneken, Luigi Pantisano, 2007, Microelectron. Reliab..

Low-frequency noise assessment of the transport mechanisms in SiGe channel bulk FinFETs

Naoto Horiguchi, Cor Claeys, Eddy Simoen, 2012, 2012 Proceedings of the European Solid-State Device Research Conference (ESSDERC).

Electrical properties of high-κ gate dielectrics: Challenges, current issues, and possible solutions

Guido Groeseneken, Luigi Pantisano, Tom Schram, 2006 .

Electrical characterization of advanced gate dielectrics

Eddy Simoen, Guido Groeseneken, Ben Kaczer, 2007 .

Roles and Effects of TiN and Pt Electrodes in Resistive-Switching HfO2 Systems

Luigi Pantisano, Dirk Wouters, Malgorzata Jurczak, 2011 .

The Role of the Interfaces in the 1/f Noise of MOSFETs with High-k Gate Stacks

Cor Claeys, Eddy Simoen, Paolo Magnone, 2009 .

Charge trapping and dielectric reliability of SiO/sub 2/-Al/sub 2/O/sub 3/ gate stacks with TiN electrodes

Philippe Roussel, Guido Groeseneken, Luigi Pantisano, 2003 .

A Study of Relaxation Current in

Guido Groeseneken, Luigi Pantisano, Marc Heyns, 2004 .

Impact of Gate Material on Low‐frequency Noise of nMOSFETs with 1.5 nm SiON Gate Dielectric: Testing the Limits of the Number Fluctuations Theory

Eddy Simoen, C. Claeys, Luigi Pantisano, 2005 .

Electron energy dependence of defect generation in high-k gate stacks

Guido Groeseneken, Ben Kaczer, Luigi Pantisano, 2008 .

Passivation and interface state density of SiO2/HfO2-based/polycrystalline-Si gate stacks

Luigi Pantisano, Tom Schram, A. Kerber, 2003 .

Anomalous positive-bias temperature instability of high-κ/metal gate devices with Dy2O3 capping

Guido Groeseneken, Luigi Pantisano, Marc Aoulaiche, 2008 .

High Hole Mobility in 65 nm Strained Ge p-Channel Field Effect Transistors with HfO2Gate Dielectric

Jerome Mitard, Jacopo Franco, Luigi Pantisano, 2011 .

Charge pumping spectroscopy: HfSiON defect study after substrate hot electron injection

Guido Groeseneken, Luigi Pantisano, Robin Degraeve, 2007 .

Reduction of the anomalous VT behavior in MOSFETs with high-κ/metal gate stacks

Luigi Pantisano, Nadine Collaert, Malgorzata Jurczak, 2007 .

Low-Frequency Noise Performance of HfO2-Based Gate Stacks

Eddy Simoen, Luigi Pantisano, Abdelkarim Mercha, 2005 .

Strong correlation between dielectric reliability and charge trapping in SiO2/Al2O3 gate stacks with TiN electrodes

Philippe Roussel, Guido Groeseneken, Luigi Pantisano, 2002 .

Charge trapping in SiO 2 /HfO 2 gate dielectrics: comparison between charge-pumping and pulsed I D -V G

Guido Groeseneken, Luigi Pantisano, Robin Degraeve, 2004 .

Correlation between charge Injection and trapping in SiO2/HfO2 gate stacks

Guido Groeseneken, Luigi Pantisano, Eduard A. Cartier, 2003 .

Origin of microwave noise from an n-channel metal–oxide–semiconductor field effect transistor

Luigi Pantisano, K. P. Cheung, K. Cheung, 2002 .

The impact of sub monolayers of HfO2 on the device performance of high-K based transistors

Luigi Pantisano, Marc Heyns, Yasuhiro Shimamoto, 2003 .

Low-Frequency ( 1 ∕ f ) Noise Performance of n- and p-MOSFETs with Poly- Si ∕ Hf -Based Gate Dielectrics

Eddy Simoen, Luigi Pantisano, Durga Misra, 2006 .

Effect of Nitridation on Low-Frequency (1/f) Noise in n- and p-MOSFETS with HFO2 Gate Dielectrics

Eddy Simoen, Luigi Pantisano, Wim Deweerd, 2006 .

Tunneling 1/ f ? noise in 5 nm HfO 2/2.1 nm SiO 2 gate stack n-MOSFETs

Eddy Simoen, Luigi Pantisano, Abdelkarim Mercha, 2005 .

Ruthenium gate electrodes on SiO2 and HfO2: Sensitivity to hydrogen and oxygen ambients

Luigi Pantisano, Tom Schram, Andre Stesmans, 2006 .

Stress polarity dependence of degradation and breakdown of SiO/sub 2//high-k stacks

Philippe Roussel, Guido Groeseneken, B. Kaczer, 2003, 2003 IEEE International Reliability Physics Symposium Proceedings, 2003. 41st Annual..

Accurate reliability evaluation of non-uniform ultrathin oxynitride and high-k layers

Philippe Roussel, Guido Groeseneken, Luigi Pantisano, 2003, 2003 IEEE International Reliability Physics Symposium Proceedings, 2003. 41st Annual..