Alain Moussa
发表
Philippe Leray,
Anne-Laure Charley,
Frederic Lazzarino,
2019,
Advanced Lithography.
Gian Francesco Lorusso,
Vito Rutigliani,
Frieda Van Roey,
2018
.
Gian Francesco Lorusso,
Vito Rutigliani,
Frieda van Roey,
2018,
Advanced Lithography.
Akira Inoue,
Rita Rooyackers,
Denis Shamiryan,
2006
.
Binary chemical nanopatterns: Fabrication and use for the controlled organization of macromolecules.
Jérôme Plain,
Alain M. Jonas,
Bernard Nysten,
2004
.
Mircea Dusa,
Anne-Laure Charley,
Lei Feng,
2020,
Advanced Lithography.
Ming Mao,
Nadia Vandenbroeck,
Daniele Piumi,
2018
.
Scatterometry and AFM measurement combination for area selective deposition process characterization
Philippe Leray,
Avron Ger,
Roy Koret,
2019,
Advanced Lithography.
Printability and propagation of stochastic defects through a study of defects programmed on EUV mask
Sandip Halder,
Philippe Leray,
Christophe Beral,
2021,
Photomask Technology.
Christoph Adelmann,
Bart Schepers,
Geoffrey Pourtois,
2012
.
Gang Wang,
Wilfried Vandervorst,
Marc Heyns,
2010
.
Wilfried Vandervorst,
Marc Heyns,
Roger Loo,
2013
.
Wilfried Vandervorst,
Thomas Hantschel,
Kai Arstila,
2009
.