Jan Willem Maes

Localized power spectral density analysis on atomic force microscopy images for advanced patterning applications

Philippe Leray, Anne-Laure Charley, Frederic Lazzarino, 2019, Advanced Lithography.

Improved cost-effectiveness of the block co-polymer anneal process for DSA

Hari Pathangi, Roel Gronheid, Boon Teik Chan, 2016, SPIE Advanced Lithography.

ALD La-Based Oxides for Vt-Tuning in High-K/Metal Gate Stacks

Christoph Adelmann, Laura Nyns, Sven Van Elshocht, 2019, ECS Transactions.

Low-temperature pre-epitaxy surface cleaning of Si and SiGe

Roger Loo, Andriy Hikavyy, Sandeep Mehta, 2015 .

Engineering the III-V Gate Stack Properties by Optimization of the ALD Process

Aaron Thean, Jacopo Franco, Stefan De Gendt, 2014 .

Remote-charge-scattering limited mobility in field-effect transistors with SiO2 and Al2O3∕SiO2 gate stacks

Yasuhiro Shimamoto, Osamu Tonomura, Matty Caymax, 2005 .