Byoung-Ho Lee

发表

AWV: high-throughput cross-array cross-wafer variation mapping

Jeong-Ho Yeo, Byoung-Ho Lee, Tae-Yong Lee, 2008, SPIE Advanced Lithography.

Developing an understanding of electron beam imaging of deep contact hole structures using Monte Carlo and spatial charge distribution simulations

Byoung-Ho Lee, Neal T. Sullivan, Yeong-Uk Ko, 2005, SPIE Advanced Lithography.

Experimental methodology of contact edge roughness on sub-100-nm pattern

Byoung-Ho Lee, Kyoung Mo Yang, Tae Yong Lee, 2004, SPIE Advanced Lithography.

Electrical defect SEM review under the various electric circumstances on SAC layer

Jeong-Ho Yeo, Byoung-Ho Lee, Tae Yong Lee, 2004, SPIE Advanced Lithography.

A Study On the Field Corrosion Test of the Anti-Corrosion Steels for Flue Gas Desulfurization System

Hong-Kyun Sohn, Byoung-Ho Lee, Jae-Won Lee, 2013 .

Novel method of under-etch defect detection for contact layers based on Si substrate using optic wafer inspection tools

Byoung-Ho Lee, Soo-bok Chin, Do-Hyun Cho, 2007, SPIE Advanced Lithography.

After development inspection (ADI) studies of photo resist defectivity of an advanced memory device

Fei Wang, Byoung-Ho Lee, Jack Jau, 2009, Lithography Asia.

After development inspection defectivity studies of an advanced memory device

Fei Wang, Byoung-Ho Lee, Jack Jau, 2010, Advanced Lithography.

Development of a novel methodology for effective partial die inspection and monitoring

Tae-Yong Lee, Byoung-Ho Lee, Andrew Cross, 2009, Advanced Lithography.

The Study of analysis and test for crash survival about the Crash Protected Module in Black Box used at aircraft

Ji-Ho Choi, Byoung-Ho Lee, Sock-Kyu Lee, 2012 .

Experimental study of contact edge roughness on sub-100 nm various circular shapes

Byoung-Ho Lee, Tae Yong Lee, Dongchul Ihm, 2005, SPIE Advanced Lithography.

Study of correlation between overlay and displacement measured by Coherent Gradient Sensing (CGS) interferometry

Yasushi Tanaka, Byoung-Ho Lee, Doug Anberg, 2016, SPIE Advanced Lithography.

Defect distribution study at through silicon via (TSV) bottom by scanning white-light interference microscopy

Timothy A. Johnson, Byoung-Ho Lee, Ho-Kyu Kang, 2012, Advanced Lithography.

Study of critical dimension and overlay measurement methodology using SEM image analysis for process control

Byoung-Ho Lee, Young Sun Cho, Tae Yong Lee, 2006, SPIE Advanced Lithography.

Crash survival analysis and tests for the capsule of voyage data recorder

Ji-Ho Choi, Byoung-Ho Lee, Sock-Kyu Lee, 2011 .

Accelerating litho technology development for advanced design node flash memory FEOL by next-generation wafer inspection and SEM review platforms

Byoung-Ho Lee, Ho-Kyu Kang, Rahul Lakhawat, 2012, Advanced Lithography.

Optical analysis on the wafer defect inspection for yield enhancement

Byoung-Ho Lee, Ho-Kyu Kang, Jeong-Ho Ahn, 2013, Advanced Lithography.

Application of novel EB-inspection to in-line monitoring for state-of -the-art DRAM products

Byoung-Ho Lee, Mari Nozoe, T. Ninomiya, 2003 .

Polarization control for enhanced defect detection on advanced memory devices

Jeong-Ho Yeo, Byoung-Ho Lee, Doron Meshulach, 2006, SPIE Advanced Lithography.

Optical characterization of defects on patterned wafers: exploring light polarization

Jeong-Ho Yeo, Byoung-Ho Lee, Silviu Reinhorn, 2004, SPIE Advanced Lithography.