Sagar A. Kekare

Device specific characterization of yield limiting pattern geometries by combining layout profiling with high sensitivity wafer inspection

Emek Yesilada, Pierre-Jerome Goirand, Jean-Christophe Le Denmat, 2015, 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).

Advances on yield learning through concurrent evaluation of design and process data

Davide Appello, Michael Hall, Christophe Suzor, 2009, 2009 IEEE/SEMI Advanced Semiconductor Manufacturing Conference.

A method for inspection of wafers and reticles using developer intent data

James N. Wiley, Carl Hess, William Volk, 2004 .

Rapid root cause analysis and process change validation with design-centric volume diagnostics in production yield enhancement

Davide Appello, Daniele Li Rosi, Christophe Suzor, 2010, 2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC).