Rafael Howell

发表

Mask process correction (MPC) modeling and its application to EUV mask for electron beam mask writer EBM-7000

Takashi Kamikubo, Hirohito Anze, Shuichi Tamamushi, 2010, Photomask Technology.

"Smart" source, mask, and target co-optimization to improve design related lithographically weak spots

Ki-Ho Baik, Xiaofeng Liu, Stephen Hsu, 2014, Advanced Lithography.

Polarized transmittance-reflectance scatterometry measurements of 2D trench dimensions on phase-shift masks

Alexander Gray, Rafael Howell, John C. Lam, 2007, Photomask Japan.

Performance and stability of mask process correction for EBM-7000

Takashi Kamikubo, Hirohito Anze, Jun Tao, 2010, Photomask Japan.

Mask-LMC: lithographic simulation and defect detection from high-resolution mask images

Yu Cao, Yoshitake Tsuji, Kinya Usuda, 2009, Photomask Japan.

Defect printability analysis by lithographic simulation from high resolution mask images

Yu Cao, Yoshitake Tsuji, Kinya Usuda, 2009, Photomask Technology.

Model based short range mask process correction

Anthony Vacca, Tadahiro Takigawa, George Chen, 2008, Photomask Japan.

Efficient full-chip SRAF placement using machine learning for best accuracy and improved consistency

Quan Zhang, Yu Cao, Yen-Wen Lu, 2018, Advanced Lithography.

Accurate characterization of 2D etch bias by capturing surrounding effects from resist and trench areas

Mu Feng, Keith Gronlund, Yongfa Fan, 2017, Advanced Lithography.

EUV resolution enhancement techniques (RETs) for k1 0.4 and below

Stephen Hsu, Jianjun Jia, Keith Gronlund, 2015, Advanced Lithography.

Full chip computational lithography for KrF multi-focal imaging (MFI) (Conference Presentation)

Will Conley, Stephen Hsu, Michael Crouse, 2021 .