A. Krause

JESSI Project E 162: status of the deep-UV resist

Anne-Marie Goethals, Francoise Vinet, Veerle Van Driessche, 1993, Advanced Lithography.

Robust and environmentally stable deep UV positive resist: optimization of SUCCESS ST2

Anne-Marie Goethals, Francoise Vinet, Thomas Fischer, 1994, Advanced Lithography.

Techniques for picosecond OBIC measurement on ICs

U. Stamm, H. Bergner, A. Krause, 1992 .