Naoki Awamura

Performance of i- and g-line phase-shift measurement system MPM-100

Hiroshi Fujita, Hisatake Sano, Takahiro Ode, 1996, Photomask and Next Generation Lithography Mask Technology.

Direct phase-shift measurement with transmitted deep-UV illumination

Takahiro Ode, Haruhiko Kusunose, Daikichi Awamura, 1996, Photomask and Next Generation Lithography Mask Technology.

Transmittance measurement with interferometer system

Takahiro Ode, Haruhiko Kusunose, Daikichi Awamura, 1996, Photomask and Next Generation Lithography Mask Technology.