T. Tanaka

Exposure and resist-process condition dependence of replicated-pattern accuracy in SR lithography

Takeo Watanabe, S. Suzuki, Shuji Fujiwara, 1993, Advanced Lithography.

Fabrication of x-ray masks with 0.15-um level two-dimensional patterns by using highly accurate FIB lithography

Takeo Watanabe, S. Suzuki, Shuji Fujiwara, 1993, Advanced Lithography.