Linyong Pang

发表

Inverse Lithography Technology (ILT) and Its Readiness for Production in Advanced Technology Nodes

Linyong Pang, Yong Liu, Dan Abrams, 2007 .

Inverse lithography technology (ILT): a natural solution for model-based SRAF at 45-nm and 32-nm

Linyong Pang, Yong Liu, Dan Abrams, 2007, Photomask Japan.

First 65nm tape-out using inverse lithography technology (ILT)

Chi-Yuan Hung, Bin Zhang, Linyong Pang, 2005, SPIE Photomask Technology.

Inverse lithography technology (ILT): keep the balance between SRAF and MRC at 45 and 32 nm

Kresimir Mihic, Linyong Pang, Dan Abrams, 2007 .

Pushing the lithography limit: applying inverse lithography technology (ILT) at the 65nm generation

Chi-Yuan Hung, Bin Zhang, Yong Liu, 2006, SPIE Advanced Lithography.

EUV multilayer defect compensation (MDC) by absorber pattern modification: improved performance with deposited material and other progresses

Ying Li, Masaki Satake, Vikram Tolani, 2012, Photomask Technology.

EUV multilayer defect compensation (MDC) by absorber pattern modification, film deposition, and multilayer peeling techniques

Ying Li, Masaki Satake, Vikram Tolani, 2013, Advanced Lithography.

Laser and e-beam mask-to-silicon with inverse lithography technology (ILT)

Linyong Pang, Dan Abrams, Nader Shamma, 2005, SPIE Photomask Technology.

Simulation-based Defect Printability Analysis on Alternating Phase Shifting Masks for 193nm Lithography

Linyong Pang, Zongchang Yu, William Volk, 2002, Photomask Technology.

Defect dispositioning using mask printability analysis on alternating phase-shifting masks

Qi-De Qian, Linyong Pang, Burn Jeng Lin, 2002, Photomask Japan.

Bridging the gaps between mask inspection/review systems and actual wafer printability using computational metrology and inspection (CMI) technologies

Masaki Satake, Vikram Tolani, Linyong Pang, 2012, Photomask Technology.

Inverse lithography technology (ILT): What is the impact to the photomask industry?

Linyong Pang, Yong Liu, Dan Abrams, 2006, Photomask Japan.

3D reconstruction of the material surface shape from stereo images of electron micrographs

Linyong Pang, 1996, Electronic Imaging.

Expanding the applications of computational lithography and inspection (CLI) in mask inspection, metrology, review, and repair

Ying Li, Vikram Tolani, Linyong Pang, 2011, Advanced Lithography.

Evaluation of inverse lithography technology for 55nm-node memory device

Ki-Ho Baik, Ying Cui, Donggyu Yim, 2008, SPIE Advanced Lithography.

Computational inspection applied to a mask inspection system with advanced aerial imaging capability

Vikram Tolani, Linyong Pang, Thuc Dam, 2010, Photomask Japan.

Real-world impact of inverse lithography technology

Yan Wang, Linyong Pang, Yong Liu, 2005, SPIE Photomask Technology.

Inverse lithography technology principles in practice: unintuitive patterns

Linyong Pang, Yong Liu, Dan Abrams, 2005, SPIE Photomask Technology.

Photomask disposition based on simulated device performance

Xiaopeng Xu, Linyong Pang, 2004, SPIE Advanced Lithography.

Enhancing DRAM printing process window by using inverse lithography technology (ILT)

Yong Liu, Andrew W. Moore, Linyong Pang, 2006, SPIE Advanced Lithography.

Inverse lithography technology at chip scale

Yan Wang, Linyong Pang, Yong Liu, 2006, SPIE Advanced Lithography.