K. K. Low

Intensity optimization for phase-shifting masks

Kevin D. Lucas, Andrzej J. Strojwas, Chi-Min Yuan, 1993, Advanced Lithography.

Automatic proximity correction for 0.35 /spl mu/m I-line photolithography

Joseph G. Garofalo, Oberdan W. Otto, Chi-Min Yuan, 1994, Proceedings of International Workshop on Numerical Modeling of processes and Devices for Integrated Circuits: NUPAD V.

Evaluation of new attenuating phase-shifting mask techniques

Kevin D. Lucas, Andrzej J. Strojwas, K. K. Low, 1994, Advanced Lithography.

Automated optical proximity correction: a rules-based approach

Christophe Pierrat, Sheila Vaidya, Joseph G. Garofalo, 1994, Advanced Lithography.

Some image modeling issues for I-line, 5X phase-shifting masks

Richard A. Ferguson, Gregory L. Wojcik, Ronald M. Martino, 1994, Advanced Lithography.