Bart Laenens

Litho and patterning challenges for memory and logic applications at the 22-nm node

Lieve Van Look, Jo Finders, Mircea Dusa, 2010, Advanced Lithography.

Optical proximity stability control of ArF immersion clusters

Lieve Van Look, Geert Vandenberghe, Joost Bekaert, 2011, Advanced Lithography.

Joint optimization of layout and litho for SRAM and logic towards the 20nm node using 193i

Michael C. Smayling, Peter De Bisschop, Mircea Dusa, 2011, Advanced Lithography.

Experimental study of effect of pellicle on optical proximity fingerprint for 1.35 NA immersion ArF lithography

Lieve Van Look, Geert Vandenberghe, Jan Richter, 2010, Advanced Lithography.

Performance of FlexRay: a fully programmable illumination system for generation of freeform sources on high NA immersion systems

Oscar Noordman, Robert Socha, Joerg Zimmermann, 2010, Advanced Lithography.

Joint-optimization for SRAM and logic for 28nm node and below

Michael C. Smayling, Peter De Bisschop, Staf Verhaegen, 2010, Advanced Lithography.