William A. Muth

Layout optimization for multilayer overlay targets

Christopher P. Ausschnitt, Lewis A. Binns, J. Schneider, 2006, SPIE Advanced Lithography.

Multilayer overlay metrology

Christopher P. Ausschnitt, Lewis A. Binns, J. Schneider, 2006, SPIE Advanced Lithography.

Smaller, smarter, faster, and more accurate: the new overlay metrology

Nelson Felix, Allen H. Gabor, Christopher P. Ausschnitt, 2010, Advanced Lithography.

Industrial strength lithography APC

Christopher P. Ausschnitt, Brian C. Barker, William A. Muth, 2003, SPIE Advanced Lithography.

Accuracy of overlay measurements: tool and mark asymmetry effects

Alexander Starikov, Daniel J. Coleman, William A. Muth, 1992 .