John McNamara

Spectral purity performance of high-power EUV systems

Guido Schiffelers, Marieke Meeuwissen, Natalia Davydova, 2020, Advanced Lithography.

Illumination source optimization in EUV lithography for staggered contact holes and pillars for DRAM applications

Gijsbert Rispens, Chang-Moon Lim, Chang-Nam Ahn, 2018, Advanced Lithography.

Usability Evaluation of a Robotic System for Cognitive Testing

Alessandro G. Di Nuovo, Daniela Conti, Alessandro Soranzo, 2019, 2019 14th ACM/IEEE International Conference on Human-Robot Interaction (HRI).

Assessment of Cognitive skills via Human-robot Interaction and Cloud Computing

Daniela Conti, Alessandro Soranzo, John McNamara, 2019, Journal of Bionic Engineering.

High NA EUV lithography: Next step in EUV imaging

Timon Fliervoet, Jan van Schoot, Stephen Hsu, 2019, Advanced Lithography.

EUV source optimization driven by fundamental diffraction considerations

Jo Finders, Paul van Adrichem, Eelco van Setten, 2017, Photomask Technology.

Mammalian decisions

James A. R. Marshall, Rafal Bogacz, John McNamara, 2008, ALIFE.

Cut!tOut: The secure cyberbullying prevention application: Technical Report

John McNamara, 2017 .

Improvements in the imaging performance of a high volume manufacturing EUV scanner with a special emphasis on the added value of the new illuminator for increased pupil flexibility

Friso Wittebrood, Timon Fliervoet, Mark van de Kerkhof, 2017, European Mask and Lithography Conference.

Optimality Models in Behavioral Biology

Edmund J. Collins, John McNamara, E. J. Collins, 2001, SIAM Rev..

Edge placement error control and Mask3D effects in High-NA anamorphic EUV lithography

Gijsbert Rispens, Bernhard Kneer, Jan van Schoot, 2017, Photomask Technology.