Daniel D. White

Development and Benchmarking of Multivariate Statistical Process Control Tools for a Semiconductor Etch Process: Improving Robustness through Model Updating

Barry M. Wise, Neal B. Gallagher, S. W. Butler, 1997 .

A comparison of principal component analysis, multiway principal component analysis, trilinear decomposition and parallel factor analysis for fault detection in a semiconductor etch process

Barry M. Wise, Neal B. Gallagher, S. W. Butler, 1999 .

Development and Benchmarking of Multivariate Statistical Process Control Tools for a Semiconductor ETCH Process: Impact of Measurement Selection and Data Treatment on Sensitivity

Barry M. Wise, Neal B. Gallagher, S. W. Butler, 1997 .