J. Richter

Calibration of CD mask standards for the 65-nm node: CoG and MoSi

Harald Bosse, Bernd Bodermann, J. Richter, 2007, European Mask and Lithography Conference.

Influences on accuracy of SEM based CD mask metrology with a view to the 32 nm node

W. Häßler-Grohne, A. Wiswesser, D. Gnieser, 2008, European Mask and Lithography Conference.

Results of a round robin measurement on a new CD mask standard

C. G. Frase, T. Scherubl, B. Bodermann, 2005, Other Conferences.