Kwang Hwyi Im

Synergic effect of acetal-based resin by blending with poly[4-hydroxy styrene-co-tert-butyl acrylate-co-4-(3-cyano-1,5-di-tert-butyl carbonyl pentyl styrene)] (P(HS-TBA-CBPS)) on the profiles of 248 nm chemically amplified resist

Yun-Gill Yim, Deog-Bae Kim, Jae-Hyun Kim, 2002, SPIE Advanced Lithography.

Insertion effects of various acid sensitive groups into acetal-type polymer on the profile of 248-nm chemically amplified resist

Yun-Gill Yim, Deog-Bae Kim, Jae-Hyun Kim, 2002, SPIE Advanced Lithography.