Andrew F. Doyle

A study on edge placement accuracy of opaque and clear defect repairs using focused ion beam technology

Diane K. Stewart, Mark L. Raphaelian, M. F. Ellis, 1998 .

Focused ion beam deposition of new materials: dielectric films for device modification and mask repair, and tantalum films for x-ray mask repair

Diane K. Stewart, J. David Casey, Andrew F. Doyle, 1995, Advanced Lithography.

State of the art in focused ion-beam mask repair systems

Diane K. Stewart, John A. Doherty, Andrew F. Doyle, 1995, Photomask and Next Generation Lithography Mask Technology.

Chemically enhanced FIB repair of opaque defects on molybdenum silicide photomasks

Diane K. Stewart, Mark L. Raphaelian, J. David Casey, 1997, Photomask Technology.

Current focused-ion-beam repair strategies for opaque defects and clear defects on advanced phase-shifting masks

Mark L. Raphaelian, J. David Casey, David C. Ferranti, 1998, Photomask and Next Generation Lithography Mask Technology.

Edge-placement accuracy of opaque and clear defect repairs using focused ion beam technology

Diane K. Stewart, K. Rose, Mark L. Raphaelian, 1997, Photomask Technology.

Chemically enhanced focused-ion-beam (FIB) repair of opaque defects on chrome photomasks

Diane K. Stewart, J. David Casey, David C. Ferranti, 1997, Photomask and Next Generation Lithography Mask Technology.

Focused ion beams for x-ray mask repair

Andrew F. Doyle, Diane K. Stewart, Thomas K. Olson, 1994, Photomask and Next Generation Lithography Mask Technology.

Chemically enhanced FIB repair of opaque defects on chrome photomasks

Diane K. Stewart, Andrew F. Doyle, J. D. Casey, 1997 .

Gas-assisted etching with focused ion beam technology

Diane K. Stewart, J. David Casey, Andrew F. Doyle, 1993 .