Joan McCall

Effect of laser mask repair-induced residue and quartz damage in sub-half-micrometer DUV wafer processes

Qi-De Qian, Pei-yang Yan, Joseph C. Langston, 1995, Photomask Technology.

Integrated method of mask data checking and inspection data prep for manufacturable mask inspection: inspection rule violations

Joan McCall, Vinod Reddy, Hyung Min Kim, 2002, SPIE Photomask Technology.

Printability of opaque repairs for DUV EPSM clear defects at sub-half-micrometer design rules

Pei-yang Yan, Joan McCall, Robert F. Hainsey, 1995, Photomask Technology.

Aerial image based die-to-model inspections of advanced technology masks

Shmoolik Mangan, Jun Kim, Vivek Balasubramanian, 2009, Photomask Technology.

Confocal Optical Metrology At 325nm

Joan McCall, Simon D. Bennett, Eric A. Peltzer, 1988, Advanced Lithography.

Deployment of OASIS.MASK (P44) as direct input for mask inspection of advanced photomasks

Emile Sahouria, Pradiptya Ghosh, Yan Liu, 2009, Photomask Technology.