Stefan Wittekoek

In-process image detection technique for determination of overlay and image quality for ASM-L wafer stepper

Rainer Pforr, Stefan Wittekoek, Roland Van Den Bosch, 1992, Advanced Lithography.

New 0.54 aperture i-line wafer stepper with field-by-field leveling combined with global alignment

Stefan Wittekoek, Martin A. van den Brink, Barton A. Katz, 1991, Other Conferences.

Evaluation of high-numerical-aperture wide-field steppers for 0.35-micron design rules

Steve D. Slonaker, Stefan Wittekoek, Martin A. van den Brink, 1992, Advanced Lithography.

Deep-UV wafer stepper with through-the-lens wafer to reticle alignment

Stefan Wittekoek, Martin A. van den Brink, Judon M. D. Stoeldraijer, 1990, Advanced Lithography.

Automatic on-line wafer stepper calibration system

Stefan Wittekoek, Theo Fahner, Martin A. van den Brink, 1990, Advanced Lithography.

Practical 0.35-um i-line lithography

Stefan Wittekoek, Steven G. Hansen, Paul Frank Luehrmann, 1994, Advanced Lithography.

Wide-field deep-UV wafer stepper for 0.35-μm production

Stefan Wittekoek, Martin A. van den Brink, Marijan E. Reuhman-Huisken, 1993, Advanced Lithography.