Dale L. Hetherington

发表

Prediction of tungsten CMP pad life using blanket removal rate data and endpoint data obtained from process temperature and carrier motor current measurements

David J. Stein, Dale L. Hetherington, 1999, Other Conferences.

Precision Alignment Packaging for Microsystems With Multiple Fluid Connections

Paul C. Galambos, Gilbert L. Benavides, Mark W. Jenkins, 2001, Micro-Electro-Mechanical Systems (MEMS).

In-line monitoring of chemical-mechanical polishing processes

David J. Stein, Dale L. Hetherington, 1999, Advanced Lithography.

A CLOSED-FORM ANALYTIC MODEL FOR ILD THICKNESS VARIATION IN CMP PROCESSES

Duane S. Boning, J. E. Chung, Iqbal Ali, 1997 .

Improved polysilicon surface-micromachined micromirror devices using chemical-mechanical polishing

Jeffry J. Sniegowski, Dale L. Hetherington, J. Sniegowski, 1998, Optics & Photonics.

CMP processing issues for MEMS fabrication technology.

Dale L. Hetherington, Amy L. Moy, 2006 .

Recent advances in endpoint and in-line monitoring techniques for chemical-mechanical polishing processes

David J. Stein, Dale L. Hetherington, 2001, Microelectronic and MEMS Technologies.

Applications of photonic crystals in optoelectronics

G. Allen Vawter, Joel R. Wendt, James G. Fleming, 1998, Other Conferences.

USING SMART DUMMY FILL AND SELECTIVE REVERSE ETCHBACK FOR PATTERN DENSITY EQUALIZATION

Duane S. Boning, Brian Lee, David J. Stein, 2000 .

Effect of process temperature on coefficient of friction during CMP

Ara Philipossian, Dale L. Hetherington, J. Sorooshian, 2004 .

Investigation of the Kinetics of Tungsten Chemical Mechanical Polishing in Potassium Iodate‐Based Slurries: II. Roles of Colloid Species and Slurry Chemistry

David J. Stein, Dale L. Hetherington, D. Hetherington, 1999 .

Investigation of the Kinetics of Tungsten Chemical Mechanical Polishing in Potassium Iodate‐Based Slurries: I. Role of Alumina and Potassium lodate

David J. Stein, Dale L. Hetherington, D. Hetherington, 1999 .

Wafer Nanotopography Effects on CMP: Experimental Validation of Modeling Methods

Duane S. Boning, John Francis Valley, Noel Poduje, 2001 .

Optimized micromirror arrays for adaptive optics

John H. Comtois, M. Adrian Michalicek, Dale L. Hetherington, 1999 .

Arrhenius Characterization of ILD and Copper CMP Processes

Duane S. Boning, Farhang Shadman, Ara Philipossian, 2004 .