Lothar Berger

发表

Process for image evaluation

Axel Korn, Lothar Berger, 1995 .

Qualification of design-optimized multi-zone hotplate for 45nm node mask making

Shun-Ho Yang, Peter Dress, Lothar Berger, 2007, Photomask Japan.

Investigation of e-beam sensitive negative-tone chemically amplified resists for binary mask making

Dirk Beyer, Martin Tschinkl, Joerg Butschke, 2003, Photomask Japan.

Haze prevention and phase/transmission preservation through cleaning process optimization

Yuan Zhang, Barry Rockwell, Min Liu, 2005, SPIE Photomask Technology.

Materials issues of SAW sensors for high-temperature applications

Christoph Ettl, Lothar Berger, Gerhard Fischerauer, 2001, IEEE Trans. Ind. Electron..

Automated CD-error compensation for negative-tone chemically amplified resists by zone-controlled post-exposure bake

Peter Dress, Hsin-Chang Lee, Hung-Chang Hsieh, 2003, SPIE Photomask Technology.

Talking Keyboard for User Guidance in Multifunction Systems

Georg Geiser, Lothar Berger, Wilfried Schumacher, 1982 .

Mobile and Stationary Sensors for Local Surveillance: System Architecture and Applications

Sandro Leuchter, Thomas Partmann, Lothar Berger, 2008, EuroISI.

Gestaltung von unmanned aerial vehicle systems im Security-Bereich

Sandro Leuchter, Thomas Partmann, Lothar Berger, 2007, Mensch & Computer Workshopband.

Global CD uniformity improvement for CAR masks by adaptive post-exposure bake with CD measurement feedback

Peter Dress, Werner Saule, Hsin-Chang Lee, 2004, Photomask Japan.

Global critical dimension uniformity improvement for mask fabrication with negative-tone chemically amplified resists by zone-controlled postexposure bake

Peter Dress, Hsin-Chang Lee, Hung-Chang Hsieh, 2004 .