Petre-Catalin Logofatu

Sensitivity analysis of fitting for scatterometry

John R. McNeil, Petre-Catalin Logofatu, J. McNeil, 1999, Advanced Lithography.

Large angle measurement by interferometry

Adrian Dobroiu, Dan Apostol, Victor Damian, 1995, Other Conferences.

Ellipsometric scatterometry for sub-0.1-μm CD measurements

S. Sohail H. Naqvi, John R. McNeil, Petre-Catalin Logofatu, 1998, Advanced Lithography.

Application of optical scatterometry to microelectronics and flat panel display processing

S. Sohail H. Naqvi, John R. McNeil, Petre-Catalin Logofatu, 1998, Optics & Photonics.

Refractometry by reflectometry

Victor Damian, Dan Apostol, Petre-Catalin Logofatu, 1995, Other Conferences.

Scatterometry: a metrology for subwavelength surface-relief gratings

John R. McNeil, Petre-Catalin Logofatu, 2001, SPIE Advanced Lithography.

Interferometric angular transducers

Adrian Dobroiu, Dan Apostol, Victor Damian, 1995, Other Conferences.

Measurement precision of optical scatterometry

John R. McNeil, Petre-Catalin Logofatu, 2001, SPIE Advanced Lithography.