Martha Sanchez

Electrical study of DSA shrink process and CD rectification effect at sub-60nm using EUV test vehicle

Yongan Xu, John Arnold, Nelson Felix, 2017, Advanced Lithography.

DSA patterning options for logics and memory applications

Akiteru Ko, John Arnold, Nelson Felix, 2017, Advanced Lithography.

EUV mask line edge roughness

Anne McGuire, Amy E. Zweber, Toshio Konishi, 2012, Advanced Lithography.