Masato Shibuya

发表

Effect of fine undulation of lens surface on the optical performance

Hiroki Ono, Masato Shibuya, Kouichi Aoyagi, 2002, International Optical Design Conference.

Mask defect inspection by detecting polarization variations

Masato Shibuya, Akira Takada, M. Shibuya, 2010, Advanced Lithography.

A Support System for Infant Music Education through Video, Sensor, and Sound Data

金田重郎, Masato Shibuya, Shigeo Kaneda, 2004 .

Long distance interferometric measurement using a polarization maintaining fiber

Masato Shibuya, Suezou Nakadate, Ukon Murayama, 2005, International Conference on Optical Fibre Sensors.

Quadrature phase-shifting interferometer using a polarization prism

Masato Shibuya, Suezou Nakadate, Tomohiro Kiire, 2006, International Commission for Optics.

Optical design methods to suppress aberrations which are caused by change of object distance

Mikio Oka, Masato Shibuya, Suezou Nakadate, 2011, Optical Systems Design.

Practical method for evaluating optical image defects caused by center artifacts

Masato Shibuya, Kazuhisa Maehara, Takao Tanabe, 2017 .

Special Section Guest Editorial:Photomask Manufacturing Technology

Morihisa Hoga, Masato Shibuya, Kiwamu Takehisa, 2016 .

Mathematical treatment of condenser aberrations and their impact on linewidth control

Masato Shibuya, Kenny K.H. Toh, Christof G. Krautschik, 1999, Advanced Lithography.

Aberration properties of odd-order surfaces in optical design

Masato Shibuya, Takao Tanabe, 2016 .

Developing a Remotely Operated Portable Mobile Robot

Takeshi Nishida, Masato Shibuya, Ryodo Tanaka, 2018, J. Robotics Mechatronics.

Theoretical study for aerial image intensity in resist in high numerical aperture projection optics and experimental verification with one-dimensional patterns

Masato Shibuya, Toshiharu Nakashima, Akira Takada, 2016 .

Improvement of two-photon absorption lithography

Masato Shibuya, Hiromi Ezaki, 2002, SPIE Advanced Lithography.

Resolution versus depth of focus in the resolution-enhanced optical system for lithography

Masato Shibuya, Tadao Tsuruta, 1993, Optical Systems Design.

A new method to decide the practical feature of Fresnel lens from the result of ultra-high refractive index method (Conference Presentation)

Masato Shibuya, Suezou Nakadate, Takashi Hiramatsu, 2016, Optical Engineering + Applications.

Image quality improvement in inspection systems using double integrator illumination

Toru Tojo, Masato Shibuya, Hitoshi Suzuki, 2007, SPIE Advanced Lithography.

A color mixer for mixed color education and its outreach activities

Yuichiro Kume, Masato Shibuya, Suezou Nakadate, 2019 .

Design of a thin see-though optical viewer with a freeform surface

Masato Shibuya, Lianhua Jin, Motoyuki Ohtake, 2020, Optical Engineering + Applications.

Comparing the experimental resist image with aerial image intensity in high-NA projection lense

Masato Shibuya, Toshiharu Nakashima, Akira Takada, 2015, Advanced Lithography.

A New Algorithm for Die-to-Wafer-like Image Mask Inspection in Real Time

Toru Tojo, Masato Shibuya, Akira Takada, 2007 .

Optical lithography at half the Rayleigh resolution limit by two-photon absorption resist

Masato Shibuya, Hiromi Ezaki, 2003, SPIE Advanced Lithography.

A color mixer for mixed color education and its outreach activities

Yuichiro Kume, Masato Shibuya, Jun Chen, 2018, Optical Review.

Criteria of limit of applying DOE to precise optics

Masato Shibuya, Suezou Nakadate, Takashi Hiramatsu, 2018, OPTO.

Verification of optics for the die-to-wafer-like image mask inspection

Toru Tojo, Masato Shibuya, Akira Takada, 2008, SPIE Advanced Lithography.

The Analytical Evaluation of Projection Optical Lithography

Masato Shibuya, Tadao Tsuruta, 1995 .

Aberration analysis of zoom lens system with freeform surface lenses using XY polynomial

Masato Shibuya, Motoyuki Ohtake, Lianhua Jin, 2021, International Optical Design Conference.

A Novel Super-Resolution Technique for Optical Lithography–Nonlinear Multiple Exposure Method

Masaya Komatsu, Masato Shibuya, Hiroshi Ooki, 1994 .

Generalizing Effective Point Spread Function and its Application to the Phase-Contrast Microscope

Masato Shibuya, Kimihiro Saito, Suezou Nakadate, 2005 .

Introduction to the special issue on optical lithography

Masato Shibuya, Andreas Erdmann, 2015 .

Resolution enhancement techniques for optical lithography and optical imaging theory

Masato Shibuya, M. Shibuya, 1997 .

Incoming inclination factor for scalar imaging theory

Masato Shibuya, Suezou Nakadate, Akira Takada, 2010 .

Simultaneous formation of four fringes by using a polarization quadrature phase-shifting interferometer with wave plates and a diffraction grating.

Masato Shibuya, Suezou Nakadate, Tomohiro Kiire, 2008, Applied optics.

Phase-shifting interferometer based on changing the direction of linear polarization orthogonally.

Masato Shibuya, Suezou Nakadate, Tomohiro Kiire, 2008, Applied optics.

Resolution enhancement techniques for optical lithography and optical imaging theory

Masato Shibuya, 1997 .

Quadrature phase-shifting interferometer with a polarization imaging camera

Toyohiko Yatagai, Masato Shibuya, Suezou Nakadate, 2010 .

Performance of resolution enhancement technique using both multiple exposure and nonlinear resist

Masaya Komatsu, Masato Shibuya, Hiroshi Ooki, 1994 .

Three-dimensional displacement measurement for diffuse object using phase-shifting digital holography with polarization imaging camera.

Toyohiko Yatagai, Masato Shibuya, Suezou Nakadate, 2011, Applied optics.