Wei-Jhe Tzai

Innovative techniques for improving overlay accuracy by using DCM (device correlated metrology) targets as reference

David Tien, Eran Amit, Howard Chen, 2014, Advanced Lithography.

Advanced gate CDU control in sub-28nm node using poly slot process by scatterometry metrology

Howard Chen, Sungchul Yoo, Chun-Chi Yu, 2013, Advanced Lithography.

Lithography process controllers and photoresist monitoring by signal response metrology (SRM)

Chien-Jen Huang, Chien-Hao Chen, Chun-Chi Yu, 2015, Advanced Lithography.

Apply multiple target for advanced gate ADI critical dimension measurement by scatterometry technology

Howard Chen, Sungchul Yoo, Chun-Chi Yu, 2012, Advanced Lithography.

Metrology of advanced N14 process pattern split at lithography

Chia-Ching Lin, Chien-Jen Huang, Chun Chi Yu, 2014, Advanced Lithography.