Dieter Adam

In-depth overlay contribution analysis of a poly-layer reticle

Frank Laske, Jochen Bender, Klaus-Dieter Roeth, 2010, Advanced Lithography.

First measurement data obtained on the new Vistec LMS IPRO4

Frank Laske, Artur Boesser, Michael Heiden, 2007, European Mask and Lithography Conference.

Large-field ion optics for projection and proximity printing and for maskless lithography (ML2)

Elmar Platzgummer, Hans Loeschner, Patrick W. de Jager, 2002, SPIE Advanced Lithography.

45nm node registration metrology on LTEM EUV reticles

Klaus-Dieter Roeth, Frank Laske, Karl-Heinrich Schmidt, 2008, European Mask and Lithography Conference.

The mobility of charge carriers in all four phases of the columnar discotic material hexakis(hexylthio)triphenylene: Combined TOF and PR‐TRMC results

John M. Warman, Dietrich Haarer, Dieter Adam, 1996 .

Charge carrier generation in a dye sensitized liquid crystal

Dietrich Prof. Dr. Haarer, Dieter Adam, Andreas Schreiber, 2000 .