Michael P. Nault

Progress of a CVD-based photoresist 193-nm lithography process

Timothy W. Weidman, Dian Sugiarto, Carol Y. Lee, 1999, Advanced Lithography.

Process optimization of a negative-tone CVD photoresist for 193-nm lithography applications

Cedric Monget, Olivier Joubert, Timothy W. Weidman, 1999, Advanced Lithography.

Feasibility of a CVD-resist-based lithography process at 193-nm wavelength

Timothy W. Weidman, Dian Sugiarto, Siddhartha Das, 1998, Advanced Lithography.

Study of Porous Silica Based Films as Low-k Dielectric Material and their Interface with Copper Metallization

Michael P. Nault, W. Kaplan, M. Eizenberg, 2002 .