A. Pikon

发表

Overcoming pattern collapse on e-beam and EUV lithography

Harun H. Solak, A. Jouve, Jean-Hervé Tortai, 2006, SPIE Advanced Lithography.

Post-lithography characterization of ArF resists for 45 nm node implant layers and beyond

J. Foucher, A. Pikon, S. Derrough, 2008, SPIE Advanced Lithography.

Ellipsometry studies of the kinetic of deprotection of thin 193 nm positive tone resist film

C. Sourd, A. Pikon, S. Derrough, 2008, SPIE Advanced Lithography.

Impact of acid diffusion length on resist LER and LWR measured by CD-AFM and CD-SEM

J. Foucher, A. Pikon, J. Thackeray, 2007, SPIE Advanced Lithography.