Richard van Haren

发表

The impact of the reticle and wafer alignment mark placement accuracy on the intra-field mask-to-mask overlay

Dirk Beyer, Richard van Haren, Steffen Steinert, 2019, Photomask Japan.

Detection and mitigation of furnace anneal induced distortions at the wafer edge

Richard van Haren, Leon van Dijk, Philippe Leray, 2019, European Mask and Lithography Conference.

Alignment robustness for 90 nm and 65 nm node through copper alignment mark integration optimization

Richard van Haren, Ramon Navarro, Jerome Depre, 2004, SPIE Advanced Lithography.

Higher order feed-forward control of reticle writing error fingerprints

Richard van Haren, Frank Sundermann, Jan Beltman, 2015, SPIE Photomask Technology.

Intra-field on-product overlay improvement by application of RegC and TWINSCAN corrections

Erez Graitzer, Richard van Haren, Jan Mulkens, 2015, Advanced Lithography.

Wafer alignment mark placement accuracy impact on the layer-to-layer overlay performance

Dirk Beyer, Richard van Haren, Steffen Steinert, 2019, Photomask Technology.

Towards fab cycle time reduction by machine learning-based overlay metrology

Richard van Haren, Leon van Dijk, Faegheh Hasibi, 2018, European Mask and Lithography Conference.

Impact of reticle writing errors on the on-product overlay performance

Richard van Haren, Frank Sundermann, Jan Beltman, 2014, Photomask Technology.

Segmented alignment mark optimization and signal strength enhancement for deep trench process

Richard van Haren, Frank Goodwin, Yuanting Cui, 2004, SPIE Advanced Lithography.

New color alignment for CMOS image sensor

Richard van Haren, Miri Kish Dagan, Remi Edart, 2007, SPIE Advanced Lithography.

Wafer-shape based in-plane distortion predictions using superfast 4G metrology

David Laidler, Richard van Haren, Leon van Dijk, 2017, Advanced Lithography.

Advances in process overlay: alignment solutions for future technology nodes

Hyun-Woo Lee, Richard van Haren, Maya Doytcheva, 2007, SPIE Advanced Lithography.

Towards Excursion Detection for Implant Layers based on Virtual Overlay Metrology

Richard van Haren, Leon van Dijk, Kedir M. Adal, 2020, 2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).

Co-optimization of RegC and TWINSCAN corrections to improve the intra-field on-product overlay performance

Dirk Beyer, Richard van Haren, Steffen Steinert, 2016, SPIE Advanced Lithography.

Pattern recognition and data mining techniques to identify factors in wafer processing and control determining overlay error

Richard van Haren, Arne Koopman, Jan Beltman, 2015, Advanced Lithography.

Smart implant-layer overlay metrology to enable fab cycle time reduction

Richard van Haren, Leon van Dijk, Faegheh Hasibi, 2019, Advanced Lithography.

Intra-field etch induced overlay penalties

Richard van Haren, Orion Mouraille, Leon van Dijk, 2020, Advanced Lithography.

Off-line mask-to-mask registration characterization as enabler for computational overlay

Dirk Beyer, Richard van Haren, Steffen Steinert, 2017, Photomask Technology.

Intra-field stress impact on global wafer deformation

Richard van Haren, Leon van Dijk, Jan Hermans, 2019, Advanced Lithography.

Study of μDBO overlay target size reduction for application broadening

Richard van Haren, Jérôme Dépré, Florent Dettoni, 2018, Advanced Lithography.

Intra-field mask-to-mask overlay, separating the mask writing from the dynamic pellicle contribution

Dirk Beyer, Richard van Haren, Steffen Steinert, 2018, Photomask Japan.

The mask contribution as part of the intra-field on-product overlay performance

Dirk Beyer, Richard van Haren, Steffen Steinert, 2020, Photomask Technology.

Machine learning for fab automated diagnostics

Richard van Haren, Manuel Giollo, Auguste Lam, 2017, European Mask and Lithography Conference.

Wafer edge overlay control solution for N7 and beyond

Richard van Haren, Leon van Dijk, Jan Hermans, 2018, Advanced Lithography.

Excursion detection and root-cause analysis using virtual overlay metrology

Richard van Haren, Leon van Dijk, Kedir M. Adal, 2021, Advanced Lithography.

On-product overlay characterization after stressed layer etch

Richard van Haren, Orion Mouraille, Leon van Dijk, 2021, Advanced Lithography.