Orion Mouraille
发表
Dirk Beyer,
Richard van Haren,
Steffen Steinert,
2019,
Photomask Japan.
Towards 22 nm: fast and effective intra-field monitoring and optimization of process windows and CDU
Jo Finders,
Huixiong Dai,
Shmoolik Mangan,
2011,
Advanced Lithography.
Dirk Beyer,
Richard van Haren,
Steffen Steinert,
2019,
Photomask Technology.
Jo Finders,
Brid Connolly,
Shmoolik Mangan,
2012,
Advanced Lithography.
Tsann-Bim Chiou,
Alek C. Chen,
Jo Finders,
2009,
Lithography Asia.
Jo Finders,
Huixiong Dai,
Chris Ngai,
2011
.
Jo Finders,
Brid Connolly,
Shmoolik Mangan,
2012,
European Mask and Lithography Conference.
Richard van Haren,
Orion Mouraille,
Leon van Dijk,
2020,
Advanced Lithography.
Dirk Beyer,
Richard van Haren,
Steffen Steinert,
2017,
Photomask Technology.
Geert Vandenberghe,
Jens Timo Neumann,
Mircea Dusa,
2011
.
Intra-field mask-to-mask overlay, separating the mask writing from the dynamic pellicle contribution
Dirk Beyer,
Richard van Haren,
Steffen Steinert,
2018,
Photomask Japan.
Dirk Beyer,
Richard van Haren,
Steffen Steinert,
2020,
Photomask Technology.
Jo Finders,
Orion Mouraille,
Bart Smeets,
2012,
European Mask and Lithography Conference.
Richard van Haren,
Orion Mouraille,
Leon van Dijk,
2021,
Advanced Lithography.