Bang-Chein Ho

Optimization of organic bottom antireflective coatings' compatibility with ArF resists

Jianhui Shan, Zhong Xiang, Eleazar Gonzalez, 2002, SPIE Advanced Lithography.

ArF photoresist system: using cycloolefin-alt-maleic anhydride pericyclic acrylate terpolymers

Bang-Chein Ho, Kung-Lung Cheng, Sheng-Yueh Chang, 1999, Advanced Lithography.

Preparation of GI plastic rods by interfacial-gel copolymerization

Bang-Chein Ho, S. Y. Young, Yih-Her Chang, 1993, Optics & Photonics.

Techniques for the analysis of Cl- ion in TMAH

Bang-Chein Ho, Mong-Ling Chang, Yu-Ping Lin, 1998, Advanced Lithography.

Double exposure for the contact layer of the 65-nm node

Bang-Chein Ho, Burn J. Lin, John C. Lin, 2005, SPIE Advanced Lithography.

Novel ArF photoresist system using acrylic polymer

Bang-Chein Ho, Jui-Fa Chang, Jian-Hong Chen, 1998, Advanced Lithography.

Thermal degradation of polymethacrylic acid

Bang-Chein Ho, Yu-Der Lee, W. Chin, 1992 .