Joseph Race

发表

Optical CD metrology for directed self-assembly assisted contact hole shrink process

Moshe Preil, Erik R. Hosler, Jun Sung Chun, 2015, Advanced Lithography.

Sensitivity analysis and line edge roughness determination of 28-nm pitch silicon fins using Mueller matrix spectroscopic ellipsometry-based optical critical dimension metrology

Moshe Preil, Gangadhara Raja Muthinti, Abhishek Gottipati, 2015 .

Mueller based scatterometry measurement of nanoscale structures with anisotropic in-plane optical properties

Alain C. Diebold, Gangadhara Raja Muthinti, Brennan Peterson, 2013, Advanced Lithography.

Fin stress and pitch measurement using X-ray diffraction reciprocal space maps and optical scatterometry

Alain C. Diebold, Gangadhara Raja Muthinti, Matthew Wormington, 2013, Advanced Lithography.

Metrology for directed self-assembly block lithography using optical scatterometry

Moshe Preil, Alain C. Diebold, Erik R. Hosler, 2014, Advanced Lithography.

Silicon fin line edge roughness determination and sensitivity analysis by Mueller matrix spectroscopic ellipsometry based scatterometry

Moshe Preil, Alain C. Diebold, Gangadhara Raja Muthinti, 2015, Advanced Lithography.

Metrology for block copolymer directed self-assembly structures using Mueller matrix-based scatterometry

Moshe Preil, Alain C. Diebold, Erik R. Hosler, 2015 .

Optical critical dimension metrology for directed self-assembly assisted contact hole shrink

Warren Montgomery, Moshe E. Preil, Erik R. Hosler, 2016 .

Scatterometric analysis of a plasmonic test structure

Brian Martinick, Nick Keller, Joseph Race, 2015, Advanced Lithography.

Enhancing one dimensional sensitivity with plasmonic coupling.

Nick Keller, Joseph Race, Samuel O'Mullane, 2014, Optics express.