K. Gabel

EUV sources for EUV lithography in alpha-, beta-, and high volume chip manufacturing: an update on GDPP and LPP technology

J. Ringling, U. Stamm, J. Kleinschmidt, 2005, SPIE Advanced Lithography.

Development status of gas discharge produced plasma Z-pinch EUV sources for use in beta-tools and high volume chip manufacturing tools

J. Ringling, U. Stamm, J. Kleinschmidt, 2005, SPIE Advanced Lithography.

Photoinduced processes in silicate glasses exposed to IR femtosecond pulses

Martin Richardson, M. J. Soileau, Oleg M. Efimov, 1997, Laser Damage.

Development of self-cooled liquid metal breeder blankets

Anton Möslang, Ulrich Fischer, H. Tsige-Tamirat, 1995 .