S. Gotze

发表

EUV sources for EUV lithography in alpha-, beta-, and high volume chip manufacturing: an update on GDPP and LPP technology

J. Ringling, U. Stamm, J. Kleinschmidt, 2005, SPIE Advanced Lithography.

Development status of gas discharge produced plasma Z-pinch EUV sources for use in beta-tools and high volume chip manufacturing tools

J. Ringling, U. Stamm, J. Kleinschmidt, 2005, SPIE Advanced Lithography.