Stephen Kovacs

System design considerations for a production-grade, ESR-based x-ray lithography beamline

Stephen Kovacs, Dan Melore, Franco Cerrina, 1991, Other Conferences.

Optimizing a synchrotron based x-ray lithography system for IC manufacturing

Stephen Kovacs, Richard Heese, Kenneth Speiser, 1990, Advanced Lithography.

X-ray optics design approach for an SXLS lithography beamline

Stephen Kovacs, Argyrios Doumas, 1992, Advanced Lithography.