Tae-Hwan Oh

Bilayer resists based on polyhedral oligomeric silsesquioxane for 193-nm lithography

Jae-Hak Choi, Hyo-Jin Yun, Kyoung-Seon Kim, 2005, SPIE Advanced Lithography.

Nanomolecular resists with adamantane core for 193-nm lithography

Jin-Baek Kim, Tae-Hwan Oh, Kyoung-Mi Kim, 2005, SPIE Advanced Lithography.

A 2.5 V 10 b 120 MSample/s CMOS pipelined ADC with high SFDR

Un-Ku Moon, Sang-Min Yoo, Tae-Hwan Oh, 2002, Proceedings of the IEEE 2002 Custom Integrated Circuits Conference (Cat. No.02CH37285).