Koji Murano
发表
Yasutaka Morikawa,
Naoya Hayashi,
Kosuke Takai,
2014,
Photomask Technology.
Naoya Hayashi,
Kosuke Takai,
Koji Murano,
2013,
Photomask Technology.
Tadahiko Takikawa,
Masamitsu Itoh,
Naoya Hayashi,
2009,
Photomask Japan.
Osamu Ikenaga,
Hidehiro Watanabe,
Kosuke Takai,
2010,
Photomask Technology.
Takeshi Koshiba,
Kazuo Tawarayama,
Hajime Aoyama,
2009,
Advanced Lithography.
Kazuo Tawarayama,
Shunko Magoshi,
Hajime Aoyama,
2010,
Advanced Lithography.
Eiji Yamanaka,
Naoya Hayashi,
Kosuke Takai,
2013,
Photomask and Next Generation Lithography Mask Technology.
Naoya Hayashi,
Masamitsu Itoh,
Suigen Kyoh,
2012,
Other Conferences.
More evolved PGSD (proximity gap suction developer) for controlling movement of dissolution products
Naoya Hayashi,
Hideaki Sakurai,
Mari Sakai,
2006,
SPIE Photomask Technology.
Takeshi Koshiba,
Kazuo Tawarayama,
Hajime Aoyama,
2009
.
Shunko Magoshi,
Hideaki Sakurai,
Kosuke Takai,
2021,
Photomask Japan.