Takashi Kamo

发表

Capability of etched multilayer EUV mask fabrication

Yasutaka Morikawa, Naoya Hayashi, Kosuke Takai, 2014, Photomask Technology.

Printability estimation of EUV blank defect using actinic image

Takashi Kamo, Takeshi Yamane, Rik Jonckheere, 2018, Advanced Lithography.

Patterning of EUVL binary etched multilayer mask

Naoya Hayashi, Kosuke Takai, Koji Murano, 2013, Photomask Technology.

Flare evaluation for 32-nm half pitch using SFET

Hajime Aoyama, Yuusuke Tanaka, Toshihiko Tanaka, 2008, SPIE Advanced Lithography.

Mask 3D effect reduction and defect printability of etched multilayer EUV mask

Yasutaka Morikawa, Satoshi Tanaka, Shunko Magoshi, 2019, Advanced Lithography.

Improvement of EUV mask defect printability evaluation

Osamu Suga, Noriaki Takagi, Tsuyoshi Amano, 2010, Advanced Lithography.

Defect printability of thin absorber mask in EUV lithography

Osamu Suga, Hajime Aoyama, Toshihiko Tanaka, 2009, Advanced Lithography.

Effects of mask absorber thickness on printability in EUV lithography with high resolution resist

Osamu Suga, Hajime Aoyama, Toshihiko Tanaka, 2008, Photomask Japan.

EUVL practical mask structure with light shield area for 32nm half pitch and beyond

Tadahiko Takikawa, Youichi Usui, Hajime Aoyama, 2008, Photomask Technology.

Process capability of etched multilayer EUV mask

Yasutaka Morikawa, Naoya Hayashi, Kosuke Takai, 2015, SPIE Photomask Technology.

Actinic phase defect detection and printability analysis for patterned EUVL mask

Takashi Kamo, Takeshi Yamane, Tsuneo Terasawa, 2010, Advanced Lithography.

Fabrication of Ta based absorber EUV mask with SRAF

Yasutaka Morikawa, Naoya Hayashi, Kosuke Takai, 2018, Photomask Japan.

Process liability evaluation for EUVL

Takeshi Koshiba, Kazuo Tawarayama, Hajime Aoyama, 2009, Advanced Lithography.

Overlay accuracy of EUV1 using compensation method for nonflatness of mask

Kazuya Ota, Osamu Suga, Yuusuke Tanaka, 2011, Advanced Lithography.

Printability of EUVL mask defect detected by actinic blank inspection tool and 199-nm pattern inspection tool

Kazuo Tawarayama, Noriaki Takagi, Tsuyoshi Amano, 2010, Photomask Technology.

Fabrication of 35nm via-hole patterns for interconnect test chips with EUV lithography

Kazuo Tawarayama, Shunko Magoshi, Hajime Aoyama, 2010, Advanced Lithography.

Thin absorber EUVL mask with light-shield border for full-field scanner: flatness and image placement change through mask process

Tadahiko Takikawa, Youichi Usui, Yuusuke Tanaka, 2009, Photomask Technology.

Etched multilayer EUV mask fabrication for sub-60nm pattern based on effective mirror width

Yasutaka Morikawa, Naoya Hayashi, Kosuke Takai, 2016, Photomask Japan.

CD correction for half pitch 2x-nm on extreme ultraviolet lithography

Kazuo Tawarayama, Hajime Aoyama, Yuusuke Tanaka, 2011, Advanced Lithography.

Impact of mask absorber properties on printability in EUV lithography

Osamu Suga, Hajime Aoyama, Toshihiko Tanaka, 2007, SPIE Photomask Technology.

Improvement of EUVL mask structure with black border of etched multilayer

Eiji Yamanaka, Naoya Hayashi, Kosuke Takai, 2013, Photomask and Next Generation Lithography Mask Technology.

Capability of DUV inspection for the LWR improved EUV mask of sub-15 nm hp on wafer

Kosuke Takai, Takashi Kamo, Eishi Shiobara, 2019, Photomask Technology.

Impact of EUV mask absorber defect with pattern-roughness on lithographic images

Osamu Suga, Hajime Aoyama, Toshihiko Tanaka, 2010, Advanced Lithography.

Mask quality assurance in cleaning for haze elimination using flexible mask specifications

Shinji Yamaguchi, Osamu Ikenaga, Toshiya Kotani, 2007, Photomask Japan.

Evaluation of EUV mask defect using blank inspection, patterned mask inspection, and wafer inspection

Kazuo Tawarayama, Noriaki Takagi, Tsuyoshi Amano, 2011, Advanced Lithography.

Phase defect printability and actinic dark-field mask blank inspection capability analyses

Takashi Kamo, Takeshi Yamane, Tsuneo Terasawa, 2011, Advanced Lithography.

DUV inspection beyond optical resolution limit for EUV mask of hp 1X nm

Masamitsu Itoh, Takashi Kamo, Takashi Hirano, 2017, Photomask Technology.

Defect management of EUV mask

Naoya Hayashi, Masamitsu Itoh, Suigen Kyoh, 2012, Other Conferences.

Process liability evaluation for extreme ultraviolet lithography

Takeshi Koshiba, Kazuo Tawarayama, Hajime Aoyama, 2009 .

Thin absorber EUV mask with light-shield border of etched multilayer and its lithographic performance

Osamu Suga, Kazuo Tawarayama, Hajime Aoyama, 2010, Photomask Japan.

Applicability of extreme ultraviolet lithography to fabrication of half pitch 35nm interconnects

Kazuo Tawarayama, Hajime Aoyama, Yuusuke Tanaka, 2010, Advanced Lithography.

EB defect inspection of EUV resist patterned wafer for hp 32 nm and beyond

Noriaki Takagi, Takashi Kamo, Takeshi Yamane, 2011, Advanced Lithography.

Blank defect coverage budget for 16nm half-pitch single EUV exposure

Yasutaka Morikawa, Takashi Kamo, Takeshi Yamane, 2018, Photomask Japan.

Influence of mask line width roughness on programmed pattern defect printability

Yasutaka Morikawa, Takashi Kamo, Takeshi Yamane, 2019, Advanced Lithography.

Evaluation of extreme ultraviolet mask defect using blank inspection, patterned mask inspection, and wafer inspection

Osamu Suga, Kazuo Tawarayama, Tsuneo Terasawa, 2011 .

Lithographic Performance of Extreme Ultravolet Full-Field Exposure Tool at Selete

Kazuo Tawarayama, Shunko Magoshi, Hajime Aoyama, 2009 .

Light-shield border impact on the printability of extreme-ultraviolet mask

Osamu Suga, Kazuo Tawarayama, Hajime Aoyama, 2011 .

Impact of extreme ultraviolet mask absorber defect with pattern roughness on lithographic images

Osamu Suga, Hajime Aoyama, Takashi Kamo, 2010 .