Norihiko Takatsu

Evaluation of mask quality control methods addressing progressive haze issues

Kaustuve Bhattacharyya, William Volk, Yoshinori Nagaoka, 2004, Photomask Japan.

Defect printability analysis of attenuated PSM using PASStm

Ichiro Kagami, Daichi Kakuta, Norihiko Takatsu, 2002, SPIE Photomask Technology.

Comparison of TeraStar SL1, TeraScanHR DDR, DDT and SL2 to identify an efficient mask re-qualification inspection mode for 7Xnm half pitch design node production reticles in advanced memory wafer fab

Paul Yu, Kosuke Ito, Yoshinori Nagaoka, 2008, Photomask Japan.